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J4  2011, Vol. 45 Issue (6): 1043-1047    DOI: 10.3785/j.issn.1008-973X.2011.06.013
徐德辉1,2, 熊斌1, 王跃林1
1.中国科学院上海微系统与信息技术研究所 传感技术国家重点实验室,微系统技术重点实验室,
上海 200050; 2.中国科学院 研究生院,北京 100039
Study of CMOS compatible micromachined thermopile infra-red
detector array
XU De-hui1,2, XIONG Bin1, WANG Yue-lin1
1. State Key Laboratory of Transducer Technology, Science and Technology on Micro-system Laboratory, Chinese
Academy of Sciences Shanghai Institute of Microsystem and Information Technology, Shanghai 200050, China;
2. Graduate School of Chinese Academy of Sciences, Beijing 100039, China
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Two 2×2 parallel-connected and series-connected micromachined thermopile infra-red (IR) detector arrays were designed and fabricated. The N-poly/Al thermocouples were placed on a floating SiO2-Si3N4-SiO2 dielectric membrane, which was released by XeF2 front-side dry isotropic etching. Since XeF2 dry etching process was used for the thermopile structure release, the fabrication yield is enhanced; because both the material and process are fully compatible with CMOS technology, the fabrication cost is reduced and the fabricated detector arrays also have the potential for mass production. For the two-dimensional parallel-connected thermopile IR detector array, the experimental results show that the parallel-connected structure can be used for scanningarea IR detection. For the seriesconnected thermopile IR detector array, the experimental results show that the series-connected structure can improve the detector's output voltage and specific detectivity, but without the improvement of responsivity.

出版日期: 2011-07-14
:  TN 379  
通讯作者: 熊斌,男,研究员.     E-mail:
作者简介: 徐德辉(1985—),男,博士生,主要从事MEMS技术研究
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徐德辉, 熊斌, 王跃林. CMOS兼容的微机械热电堆红外探测器阵列研究[J]. J4, 2011, 45(6): 1043-1047.

XU De-hui, XIONG Bin, WANG Yue-lin. Study of CMOS compatible micromachined thermopile infra-red
detector array. J4, 2011, 45(6): 1043-1047.


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