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 机械工程

1.浙江大学 机械工程学院,浙江 杭州 310027；2.中国矿业大学 机电工程学院,江苏 徐州 221116
Influences of surface topography on electrical pitting
WANG Jiu gen1,FENG Lan lan1,LI Yang2
1.Department of Mechanical Engineering,Zhejiang University,Hangzhou 310027,China；2.School of Mechatronic Engineering,China University of Mining and Technology,Xuzhou 221116,China
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Abstract:
For the bearings and gears in nominal line contacts, the three dimensional rough surfaces of elements were simulated with two fractal models, a simple contact model with the contact between a rough  surface and a smooth rigid plane, and a complicated contact model with the contact of two rough surfaces were established. The calculation models of contact resistance with rectangular spots and current density of rough surfaces were established. The influences of surface topography on electrical pitting were analyzed from the point of contact resistance and current density. The influences of contact load and fractal parameters on the real contact area, contact resistance and current density were analyzed.  And the quantitative relationship between contact resistance and surface roughness as well as that between current density and surface roughness were studied under constant load. The results demonstrate that, either from the perspective of contact resistance or that of current density, the increase of the contact load and the reduction of the surface roughness of bearings and gears can prevent  electrical
pitting. Therefore, contact resistance can be used as an evaluation criterion of  electrical pitting as well as current density. In practical applications, the active design of optimal contact load and optimal surface roughness can prevent electrical pitting, and the complicated model should be used in the study of contact problems between rough surfaces. The proposed method can analyze the surface failures of electrical pitting．

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#### 引用本文:

WANG Jiu gen,FENG Lan lan,LI Yang. Influences of surface topography on electrical pitting. JOURNAL OF ZHEJIANG UNIVERSITY (ENGINEERING SCIENCE), 10.3785/j.issn.1008 973X.2015.11.001.

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