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ZJUS-A
Journal of Zhejiang University-SCIENCE A (Applied Physics & Engineering)  2005, Vol. 6 Issue ( 8): 17-    DOI: 10.1631/jzus.2005.A1007
    
Mask synthesis and verification based on geometric model for surface micro-machined MEMS
LI Jian-hua, LIU Yu-sheng, GAO Shu-ming
State Key Lab of CAD&CG, Zhejiang University, Hangzhou 310027, China
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Abstract  Traditional MEMS (microelectromechanical system) design methodology is not a structured method and has become an obstacle for MEMS creative design. In this paper, a novel method of mask synthesis and verification for surface micro-machined MEMS is proposed, which is based on the geometric model of a MEMS device. The emphasis is focused on synthesizing the masks at the basis of the layer model generated from the geometric model of the MEMS device. The method is comprised of several steps: the correction of the layer model, the generation of initial masks and final masks including multi-layer etch masks, and mask simulation. Finally some test results are given.

Key words： MEMS      CAD      Geometric model      Layer model      Mask synthesis      Surface micromachining     
Received: 10 February 2005     
CLC:  TP391.7  
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LI Jian-hua
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GAO Shu-ming
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LI Jian-hua, LIU Yu-sheng, GAO Shu-ming. Mask synthesis and verification based on geometric model for surface micro-machined MEMS. Journal of Zhejiang University-SCIENCE A (Applied Physics & Engineering), 2005, 6( 8): 17-.

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http://www.zjujournals.com/xueshu/zjus-a/10.1631/jzus.2005.A1007     OR     http://www.zjujournals.com/xueshu/zjus-a/Y2005/V6/I 8/17

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