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ZJUS-A
Journal of Zhejiang University-SCIENCE A (Applied Physics & Engineering)  2004, Vol. 5 Issue (12): 1548-1553    DOI: 10.1631/jzus.2004.1548
Environmental & Energy Science     
Synthesis of TiO2 supported on activated carbon by MOCVD: operation parameters study
ZHANG Xing-wang, ZHOU Ming-hua, LEI Le-cheng, XU Su
Institute of Environmental Engineering, Zhejiang University, Hangzhou 310027, China
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Abstract  The metallo-organic chemical vapor deposition (MOCVD) technique has been applied to the preparation of the photocatalyst titanium dioxide supported on activated carbon. The effects of various condition parameters such as carrier gas flow rate, source temperature and deposition temperature on the deposition rate were investigated. The maximum deposition rate of 8.2 mg/(g·h) was obtained under conditions of carrier gas flow rate of 400 ml/min, source temperature of 423 K and deposition temperature of 913 K. The deposition rate followed Arrhenius behavior at temperature of 753 K to 913 K, corresponding to activation energy Ea of 51.09 kJ/mol. TiO2 existed only in anatase phase when the deposition temperature was 773 K to 973 K. With increase of deposition temperature from 1073 K to 1273 K, the rutile content sharply increased from 7% to 70%. It was found that a deposition temperature of 773 K and a higher source temperature of 448 K resulted in finely dispersed TiO2 particles, which were mainly in the range of 10~20 nm.

Key words： MOCVD      Supported materials      Supersaturation      Titanium dioxide     
Received: 16 September 2003     
CLC:  X505  
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ZHOU Ming-hua
ZHANG Xing-wang
LEI Le-cheng
XU Su
Cite this article:

ZHANG Xing-wang, ZHOU Ming-hua, LEI Le-cheng, XU Su. Synthesis of TiO2 supported on activated carbon by MOCVD: operation parameters study. Journal of Zhejiang University-SCIENCE A (Applied Physics & Engineering), 2004, 5(12): 1548-1553.

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http://www.zjujournals.com/xueshu/zjus-a/10.1631/jzus.2004.1548     OR     http://www.zjujournals.com/xueshu/zjus-a/Y2004/V5/I12/1548

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