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Journal of Zhejiang University-SCIENCE A (Applied Physics & Engineering)  2004, Vol. 5 Issue (2): 198-205    DOI: 10.1631/jzus.2004.0198
Bioscience & Biotechnology     
Degradation kinetics and mechanisms of phenol in photo-Fenton process
HE Feng, LEI Le-cheng
Department of Environmental Engineering, Zhejiang University, Hangzhou 310027, China
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Abstract  Phenol degradation in photochemically enhanced Fenton process was investigated in this work. UV-VIS spectra of phenol degradation showed the difference between photo-Fenton process and UV/H2O2, which is a typical hydroxyl radical process. A possible pathway diagram for phenol degradation in photo-Fenton process was proposed, and a mathematical model for chemical oxygen demand (COD) removal was developed. Operating parameters such as dosage of H2O2 and ferrous ions, pH, suitable carrier gas were found to impact the removal of COD significantly. The results and analysis of kinetic parameters calculated from the kinetic model showed that complex degradation of phenol was the main pathway for removal of COD; while hydroxyl radicals acted weakly in the photo-Fenton degradation of phenol.

Key wordsPhenol      Photo-Fenton process      Kinetics      Radical oxidation      Complex oxidation     
Received: 10 February 2003     
CLC:  TQ150.9  
  X783  
Cite this article:

HE Feng, LEI Le-cheng. Degradation kinetics and mechanisms of phenol in photo-Fenton process. Journal of Zhejiang University-SCIENCE A (Applied Physics & Engineering), 2004, 5(2): 198-205.

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http://www.zjujournals.com/xueshu/zjus-a/10.1631/jzus.2004.0198     OR     http://www.zjujournals.com/xueshu/zjus-a/Y2004/V5/I2/198

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