| Radio Electronics |
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| Characterization of a-Si:H/SiN multilayer waveguide polarization using an optical pumping application鈥擫ED |
| Mohd Saiful Dzulkefly ZAN, Isamu KATO, Mohammad Syuhaimi AB-RAHMAN, Seri Mastura MUSTAZA |
| Department of Electrical, Electronic and System Engineering, Faculty of Engineering and Built Environment, Universiti Kebangsaan Malaysia, Bangi 43600, Malaysia; Department of Electrical Engineering and Bioscience, Waseda University, Tokyo 169-855, Japan |
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Abstract This paper describes the fabrication of a waveguide and the analysis of its polarization characteristics by applying light-emitting diode (LED) pumping lights to its surface. By using double tubed coaxial line (DTCL) microwave plasma chemical vapor deposition (MPCVD) equipment, an a-Si:H/SiN multilayer waveguide was fabricated whose thickness could be controlled at nanometer order. The main structural material of the waveguide sample consisted of a combination of layers of amorphous silicon hydrogen and silicon nitrate. Once the sample was ready, another major objective of the experiment was to analyze the polarization characteristics of the fabricated waveguide. The idea of the experiment was to analyze how the waveguide reacts when three types of LED (blue, yellow, and red) are radiated onto its surface. The results showed that the fabrication of the a-Si:H/SiN sample is successful. Most effective transmission results, which accord with the polarization characteristics analysis, were obtained.
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Received: 30 April 2008
Published: 12 October 2009
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